color photoresist

Photoresist (Color Resists) is the main raw material of color filter, for LCD display color performance source, its penetration, saturation, contrast, heat resistance, light resistance and chemical resistance and other characteristics, all affect the color performance of LCD display. With the continuous improvement of panel specifications, the contrast and penetration requirements of color photoresist are also increasing. With years of accumulated experience in material development, we have overcome the defects of dyes in heat resistance and light resistance characteristics and launched a new generation of color light resistance products.

Product characteristics

1. Process characteristics: high coating uniformity, high sensitivity, large display process window.

2. Reliability: high heat resistance, high optical resistance, high chemical resistance, high storage stability.

3. Color performance: high penetration, high saturation, high contrast.

BM black photoresist

Black matrix resist (Black Matrix Resist) high light shielding to distinguish the RGB three primary colors and improve the contrast. In response to the demand for high-resolution panel products, we have introduced high-resolution and high-impedance black photoresist products with our own resin synthesis, monomer modification and carbon black dispersion technology, etc., under the key raw material matching formulation technology.

Product characteristics

1. Process characteristics: high light shielding, high coating uniformity, high sensitivity, high adhesion, large display process window

2. Reliability: high heat resistance, high optical resistance, high chemical resistance, high storage stability

alignment film PI

In a liquid crystal display, a liquid crystal material is provided with good rotational order by an alignment film. The demand for hand-held products is increasing rapidly. Our company aims at FFS-type alignment film products with higher optical performance characteristics, from monomer research and development of alignment film to polyimide synthesis trial production. We have mastered unique patent structure and can provide more competitive new generation products.

Product characteristics

1. Low residual image, high VHR, excellent reliability.

2. Brushless grinding moire, dust.

3. Pretilt angle stability is good.

4. No alignment defects after high temperature and high humidity.